Case Study

Semiconductor Wafer Metrology Tool

Overview

Semiconductor manufacturing machines require extremely precise and high speed motion systems.  Our customer trusted our high-performance RMP EtherCAT Motion Controller to deliver the extreme accuracy they needed to succeed.

Company:
KLA
Location:
California, USA
Website:
visit
Date:
Sep 2011

Solution

Motion Controller Features

Multi-Axis Coordinated Motion - This application required coordinated streaming path motion so the X, X’, Y, and Z axes could follow a path trajectory.

Deterministic IO trigger within 250µs -The customer required several IO functions to be performed both quickly and deterministically. Our RMP EtherCAT Motion Controller includes several features that enabled them to trigger outputs based on pre-programmed events with 250µs.

Electronic Gearing - Our customer utilized the electronic gearing feature in our RMP EtherCAT Motion Controller to gear the X and X’ axes together and control it as a single gantry axis.

Custom Control Algorithm Design

RSI assisted in the development of a custom control algorithm which applies a torque bias to opposing motors to eliminate backlash. Coupled with our Dual Loop Feedback feature, this architecture yielded significantly improved tracking accuracy and performance.

Hardware Selection

RSI assisted with the selection of the servo system including the motors, drives, gearheads, precision encoders, and gear segments to withstand the worst elements of nature.

Testimonial

Technologies

  • sRMP EtherCAT Motion Controller
  • Ultra high Precision Angular Encoders
  • Servo Motors
  • High Torque Gearheads
  • EtherCAT Servo Drives

Benefits

  • Extremely reliable control solution for mission critical applications.
  • Custom torque bias control algorithm achieves zero backlash and arc-second system accuracy.
  • Real time OS integration for application development.
  • High performance tracking ability to target objects on Land, at Sea, or in the Air.

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